| RTP-H2 | Hydrogen option with Safety device (Sensor and Hydrogen monitoring) |
| RTP-H2S | Safety device for Hydrogen option (with cover and sensor) |
| RTP-MFC | Additional process gas line with Mass Flow Controller (max. 3 add) = all in all max. 4 process gas lines |
| RTP-Ox | Oxygen Analyzer to measure Oxygen residues (not in combination with Hydrogen Option) |
| RTP-MM | Moisture Analyzer to measure moisture residues in the chamber |
| RTP-SW | Switchbox for chiller and vacuum pump |
| RTP-TC | Add. Thermocouple to measure on device (plugged in chamber, max. 1) |
| RTP-EP | Ramp up rate up to 150 K/sec. |
| RTP-150-HT | Higher temperature up to 1200 °C |
| RTP-XHT | Extended holding time temperature |
| FG-O2 | Safety unit (when forming as and Oxygen is used) |
| PT | Signal tower for status |
| TC I | Additional thermocouple with external connection (max. 1 add.) |
| TC II | Additional thermocouple with internal connection (max. 1 add.) |
| VAC I | Basic Vacuum up to 3 hPa, Vacuum sensor, Vacuum valve excl. pump |
| VAC II | Comfort Vacuum up to 10-3 hPa, Pirani Sensor, Vacuum valve, excl. pump |
| VCR | Tubing made of VCR (welded) |
| RTP150-GS-160 mm | Graphite Plate or susceptor (optional SiC coated) |
| RTP-PC-150 | Add. 100 mm oven chamber = double chamber (for usage of 2 chambers) |
| RTP150-QTW-75 mm | Adapter (quartz ring) for 75 mm wafer |
| RTP-150-QTW-100 mm | Adapter (quartz ring) for 100 mm wafer |
| RTP150-QTW-150 mm | Quartz tray for 150 mm wafer |
| RTP150-QTSW-156×156 | Quartz tray for solar wafer |
| RTP150-QTSW-182×182 | Quartz trax for solar wafer |
| MP | Membrane/ diaphragm pump for vacuum up to 3 hPa |
