快速升溫真空烘箱 RTP-200

廠牌：德國UNITEMP
適用於各種半導體工藝、原型研究、質量控制、退火、快速熱處理、SiAu、SiAl、SiMo合金化、低k電介質、植入後退火、銅膏燒製、電阻膏燒成、玻璃上的矽太陽能晶圓電池等。
精確快速的上升和下降速率。
良好的溫度均勻性。
最多可達4條氣體管線。
集成數據紀錄。
SIMATIC^®控制器。
紅外燈加熱。
50個程序，每個程序有50個編程。
佔地面積小的桌面系統。

產品規格

項目	說明
RTP-EP	Extended power with ramp rate better 100K/sec (power x 2)
RTP-HT	Extended temperature up to 1200 °C
RTP-MFC	Additional process gas line with Mass Flow Controller (max. 3 add)* * = all in all max. 4 process gas lines
FG-O2	Forming gas – oxygen safety unit
RTP-Ox	Various oxygen analyser with different tolerances against H traces
RTP-MM	Moisture Analyzer to measure moisture residues in the chamber
RTP-SW-VP / CH	Switchbox for chiller and/or vacuum pump
TC I / TC II	add. Thermocouple to measure on device (plugged in chamber, max. 1)
VAC I	Basic Vacuum up to 3 hPa, Vacuum sensor, vacuum valve excl. pump (not for -HV)
VAC II	Comfort Vacuum up to 10^-3hPa, Pirani Sensor, vacuum valve, excl. pump (not for HV)
VCR	Tubing made of VCR (welded)
RTP-GP-200	Graphite Plate or susceptor (optional SiC coated)
RTP-PC-200	add. 200 mm oven chamber = double chamber (for usage of 2 chambers)
RTP-QF-200-200mm	Quartz frame for 200 mm wafer
RTP-QF-200-150mm	Quartz frame for 150 mm wafer
RTP-QF-200-100mm	Quartz frame for 100 mm wafer